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Search for "sub-10 nm colloidal lithography" in Full Text gives 1 result(s) in Beilstein Journal of Nanotechnology.
Sub-10 nm colloidal lithography for circuit-integrated spin-photo-electronic devices
Beilstein J. Nanotechnol. 2012, 3, 884–892, doi:10.3762/bjnano.3.98
- materials with relatively short characteristic relaxation lengths. Keywords: magnetic point contact arrays; spin laser; sub-10 nm colloidal lithography; Introduction Colloidal lithography [1] is a method to reproduce patterns in a variety of natural systems and is used more and more as an efficient
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